Txheeb xyuas qhov cuam tshuam ntawm Polishing hmoov Particle loj ntawm Polishing

Cov neeg feem coob paub tias cov ntsiab lus tseem ceeb uas cuam tshuam rau cov nyhuv ntawm polishing hmoov yog: A, hmoov suspension B, Crystal daim ntawv ntawm hmoov C, hmoov Mohs hardness D, Particle loj npaum li cas ntawm polishing hmoov cuam tshuam rau polishing txheej txheem?
Qhov loj me me thiab kev faib tawm ntawm lub ntiaj teb tsis tshua muaj polishing hmoov muaj qhov cuam tshuam loj rau kev ua haujlwm ntawm polishing hmoov
1. Daim ntawv thov ntawm polishing hmoov particle loj;
Tsis tshua muaj lub ntiaj teb polishing hmoov kuj tuaj yeem raug cais raws li ntau hom additives. Cov thev naus laus zis ntawm lub ntiaj teb tsis tshua muaj polishing hmoov belongs rau micro hmoov engineering tshuab, thaum lub ntiaj teb tsis tshua muaj polishing hmoov belongs rau ultrafine hmoov. Feem ntau, ultrafine hmoov muab faib ua peb hom: nanoscale (1nm ~ 100nm); Submicron nplai (100nm ~ 1 μm); Raws li qhov kev faib tawm no, cov hmoov av tsis tshua muaj hauv ntiaj teb tuaj yeem muab faib ua peb pawg: nanoscale rare earth polishing hmoov, submicron rare earth polishing hmoov, thiab micrometer tsawg lub ntiaj teb polishing hmoov. Lub ntiaj teb tsis tshua muaj polishing hmoov peb feem ntau siv yog feem ntau micrometer qhov loj me, nrog rau qhov loj me me ntawm 1 μ m thiab 10 μ m. Tsis tshua muaj lub ntiaj teb polishing hmoov feem ntau yog siv nyob rau hauv lub tom ntej theem ntawm iav polishing rau zoo sib tsoo raws li lawv lub cev thiab tshuaj zog, yog li lawv cov particle loj faib feem ntau tsis ntau tshaj 10 μ m. Polishing hmoov nrog qhov ntau thiab tsawg dua 10 μ m (xws li cov hmoov av tsis tshua muaj hauv ntiaj teb polishing) feem ntau yog siv rau kev sib tsoo ntxhib nyob rau theem pib ntawm kev ua iav.
2. Lub zog ntawm lub ntiaj teb tsis tshua muaj polishing hmoov particle loj tis;
Rau polishing hmoov nrog cov khoom sib txawv thiab cov txheej txheem ua tiav, qhov loj dua qhov nruab nrab particle loj, qhov ceev ntawm iav sib tsoo ceev thiab nto roughness. Feem ntau, polishing hmoov nrog particle loj ntawm li 4 μ m muaj kev sib tsoo ceev. Ntawm qhov tsis sib xws, yog tias qhov nruab nrab qhov loj me ntawm cov hmoov polishing me me, qhov sib tsoo txo ​​qis, kev sib tsoo ceev txo, thiab qhov flatness ntawm iav nto zoo dua. Txheem polishing hmoov feem ntau muaj qhov nqaim particle loj faib, nrog ob peb cov khoom uas zoo dhau los yog ntxhib dhau. Polishing hmoov yam tsis muaj cov khoom loj tuaj yeem txhuam qhov chaw zoo, thaum polishing hmoov nrog cov khoom me me tuaj yeem txhim kho kev sib tsoo ceev.
3. Daim ntawv thov ntawm lub ntiaj teb tsis tshua muaj polishing hmoov ntawm nanoscale;
Sub micron tsis tshua muaj lub ntiaj teb polishing hmoov nrog qhov loj me feem ntau tsawg dua 1 μ m tau nce nqi hauv kev ua haujlwm ntawm cov kua siv lead ua kua thiab khoos phis tawj CDs, thiab lawv cov khoom tsim tau nce xyoo los ntawm xyoo. Nano nplai tsawg lub ntiaj teb polishing hmoov kuj tau qhia. Nrog rau txoj kev loj hlob ntawm kev tshawb fawb thiab thev naus laus zis niaj hnub no, nws cov ntawv thov kev cia siab yuav tsis tuaj yeem kwv yees, tab sis nws txoj kev lag luam tseem tsawg heev thiab nws yog nyob rau theem kev tshawb fawb thiab kev loj hlob.