Hauv thaj tsam ntawm kev ua cov iav sib sib zog nqus, kev ua kom ntse ntse yog cov txheej txheem tseem ceeb uas txiav txim siab cov khoom lag luam thiab cov txiaj ntsig tau qhia, dav siv dav hauv kev ua haujlwm siab - kawg xws li tsim cov ntaub thaiv phab ntsa, iav tsheb, thiab cov yeeb yaj kiab digital. Txawm li cas los xij, cov txheej txheem sprucing tsis muaj teeb meem cuam tshuam los ntawm ntau yam khoom xws li cov khoom siv, cov cuab yeej tsis muaj, thiab kev tswj ib puag ncig, ua rau nws xav tau ntau yam tsis xws luag.
I. Sib sib zog nqus
Sib sib zog nqus khawb yog qhov feem ntau nquag thiab cuam tshuam tam sim ntawd hauv iav polishing. Lawv tshwm sim raws li pom linear grooves ntawm polished nto. Nyob rau hauv qhov xwm txheej hnyav, pom meej me me refraction tuaj yeem nyob ntawm qhov kev sim kis me me, thiab qhov pom tseeb, lub zog tuaj yeem hnov qab thaum khawb nrog rau cov ntiv tes.
Deep Cause Analysis:
Kev phom sij zais los ntawm cov txheej txheem dhau los: Kev tshem tawm tsis tiav ntawm cov pinholes thiab khawb tawm los ntawm cov txheej txheem sib tsoo ua ntej hauv qhov kev sib tsoo thawj zaug, lossis kev ntxuav tsis txaus tom qab sib tsoo, ua rau impurities adhering rau saum npoo thiab tsim cov khawb lwm qhov ntawm qee qhov ntawm cov txheej txheem sprucing.
Polishing daim ntaub kab mob thiab tsis ua hauj lwm: Tsis sib npaug particle ntsuas tis ntawm sprucing hmoov, lub xub ntiag ntawm loj heev mechanical impurities, los yog sedimentation thiab stratification ntawm sharpening slurry tom qab siv txuas ntxiv ua rau muaj kev sib tsoo muaj peev xwm; ncua kev siv cov ntaub qhwv ntsej muag (xws li cov ntaub qhwv polyurethane) cuam tshuam hauv kev tsim cov plhaub tawv tawv rau hauv pem teb lossis cov khoom sib txuam ntawm cov tawv tawv ntawm cov npoo, poob qis sib tsoo muaj peev xwm.
Systematic Solutions:
Tsim kom muaj qhov ua ntej- txheej txheem kev tswj hwm tshwj xeeb: Tom qab kev sib tsoo zoo, siv lub interferometer dawb me me los ntsuam xyuas hauv pem teb roughness (Ra nqi tsawg dua los yog sib npaug rau 0.02μm) kom paub tseeb tias tsis muaj qhov pom tseeb khawb ua ntej tshaj qhov xav mus rau txheej txheem sprucing; Tom qab sib tsoo, siv 40kHz ultrasonic ntxuav rau 5-10 feeb kom tshem tawm tag nrho cov seem seem ntawm qhov chaw.
Optimize sprucing npuag tswj: Xaiv cov hmoov sprucing nrog ib tug slender particle dimension tis; txhim khu kev ncua nrog cov dispersant ua ntej siv kom tsis txhob clumping; teeb tsa ib qho yooj yim sharpening ncoo lwm qhov system; cov ntaub qhwv polyurethane ib txwm yuav tsum tsis txhob siv txuas ntxiv mus ntev dua li yim teev, thiab yuav tsum tau hloov tam sim no yog tias pom pom hauv pem teb.
II. Nto Haze
Haze manifests raws li ib tug poob ntawm daim iav-zoo li luster nyob rau hauv polished iav nto, imparting ib tug zoo li mis nyuj - dawb paug los yog zaj sawv-zoo li tus qauv. Qhov no ua rau muaj kev cuam tshuam me me thiab ua rau muaj kev puas tsuaj loj hauv kev tsim cov iav tsom iav thiab lub tsheb cua.
Nyob rau hauv - qhov tob ntawm Kev Tshawb Fawb
Kev tsis sib haum ntawm Polishing Fluid Physicochemical Properties: Kev tswj xyuas tsis raug, xws li kev ua kom pom kev ntxhib los mos ntau dua 20% lossis thawj -chav kawm sprucing xim qis dua 5%, ua rau tsis sib xws ntawm cov khoom abrasive thiab iav nto. Tus nqi pH sib txawv los ntawm qhov sib txawv ntawm qhov tsis sib haum xeeb nyob rau hauv immoderate acidity corroding iav nto, whilst immoderate alkalinity motives sharpening hmoov agglomeration.
Tsis tswj kub thiab av noo: Polishing ambient kub tshaj 25℃los yog av noo> 60% motive lub sprucing kua kom evaporate sai heev, tawm hauv seem seem tsim ib haze txheej. Qhov sov sov tsim los ntawm kev ua haujlwm txuas ntxiv ntawm lub khoos phis tawj sprucing tsis tuaj yeem cuam tshuam rau lub sijhawm, lub ntsiab rau hauv cheeb tsam kub yuav nce rau hauv pem teb iav thiab ua rau cov hmoov sintering residue.
Kev daws teeb meem
Tsim kom muaj qhov tshwj xeeb sharpening slurry mixing system: nruj me ntsis ua raws li qhov sib tov sib xyaw. Rau polishing nyuaj, siv cov hmoov: dej piv ntawm 1: 5-1: 10; rau polishing zoo, siv 1:15-1:20. Txheeb xyuas tus nqi pH txhua ob teev thiab hloov nws mus rau qhov sib txawv ntawm 6-8 qhov kev siv dilute hydrochloric acid los yog sodium hydroxide tov, nrog rau 0.3% dispersant kom nres particle sedimentation.
Ua kom zoo ib puag ncig tswj cov xwm txheej: Siv qhov chaw ua haujlwm kub thiab av noo ib txwm, nrog ntsuas kub ntawm 18-25℃thiab av noo ntawm 50% -60%. Muab cov iav sprucing nrog cov khoom siv dej txias kom paub tseeb tias qhov kub hauv pem teb ntawm lub ntsej muag ntse tsis tshaj 40 degree. Siv ib qho kev sib txuas sib txuas, nres rau peb feeb kom txias tom qab txhua 15 feeb ntawm kev ua haujlwm.
III. Ntug Chamfering Defects: Ib qho kev hem thawj rau kev nyab xeeb thiab qhov tseeb
Ntug chamfering tsis xws luag feem ntau tshwm sim raws li qhov tsis sib xws chamfering, chipping, burrs, los yog residual cov ces kaum. Cov no yog cov pheej hmoo tshwj xeeb hauv tempered iav ua, tsis muaj teeb meem loj rau facet breakage; hauv cov iav digital, lawv muaj kev cuam tshuam rau kev sib ntsib tom ntej.
Hauv -kev ntsuas qhov tob ntawm cov hauv paus ntsiab lus:
Kev xaiv lub log tsis zoo thiab kev teeb tsa: Kev ntsuas grit ntawm cov xaiv chamfering sharpening log tsis noj qab haus huv lub chamfering precision. Coarse-grit log yam tsis muaj teeb meem motive side chipping, whilst fine-grit wheels are too inefficient. Lub concentricity yuam kev ntawm lub sprucing log thiab cov ntxaiv tshaj 0.1mm, ua rau tsis sib xws siab faib.
Txoj kev pub mis ua haujlwm tsis raug: tsis sib xws ntawm qee qhov taw qhia kev noj zaub mov, nrog rau ncua lossis nrawm; txaus ntshai fixture positioning raug nyob rau hauv lub chav kawm ntawm automated pub, inflicting tus cwj pwm ntawm lub iav thiab lub sprucing log kom deviate los ntawm lub teeb nqi.
Systematic solutions:
Precisely noj qab nyob zoo sprucing log rau cov txheej txheem: Xaiv sprucing log raws li lub chamfering precision. Siv 800-1200 grit resin log rau iav niaj hnub thiab 1500-2000 grit wool log rau cov iav digital. Tom qab kev teeb tsa, siv lub dial taw qhia kom ntsuas qhov sib npaug, ua kom muaj qhov yuam kev tsawg dua lossis sib npaug li 0.05mm.
Optimize chamfering txheej txheem tsis: Rau niaj hnub iav, tswj lub chamfering pace ntawm 5-8 m / min thiab lub strain ntawm 1-1.5 kg / cm²; rau iav tempered, txo qhov nrawm mus rau 3-5 m / min thiab strain mus rau 0.8-1 kg / cm²; xauj segmented polishing, thawj zaug tawv sprucing los tsim lub chamfer, ces txaus siab sprucing kom tshem tau ntawm burrs.
Kev kho qhov tsis zoo thiab kev tshuaj xyuas: Qhov chaw me me chipping yog manually ntub- hauv av nrog 1000-grit sandpaper, nrog rau txoj kev zoo sharpening nrog cov ntaub plaub- lub taub hau sprucing log; qhov kawg chipping yuav tsum rov txiav qhov ua ntej tshaj chamfering; rau txhua batch ntawm cov khoom, siv lub chamfering gauge los saib lub kaum sab xis, thiab siv ib tug roughness tester los saib cov cheeb tsam Ra nqi tsawg dua los yog sib npaug zos rau 0.05 μm.
Kev txhim kho iav sprucing nplua tsis tuaj yeem ua tiav ntawm kev ua kom zoo ntawm ib kauj ruam; nws yuav tsum tau teeb tsa tag nrho cov saw gadget ntawm "cov ntaub ntawv tswj hwm - kev ua kom zoo dua qub - ib puag ncig tswj - cov lus tshuaj xyuas." Cov tuam txhab lag luam yuav tsum tau nce cov kev xav tau tshwj xeeb raws li lawv tus kheej cov yam ntxwv ntawm cov khoom lag luam, ntxiv dag zog rau cov neeg siv khoom muaj peev xwm kev cob qhia, thiab qhia cov cuab yeej saib xyuas digital rau lub sijhawm tiag tiag -. Los ntawm kev hais txog 5 qhov teeb meem tsis tu ncua uas tau teev tseg saum toj no, tus nqi tsim nyog tau txais txiaj ntsig zoo tuaj yeem txhim kho tau zoo, cov nqi tsim khoom txo qis, thiab cov kev sib tw tseem ceeb hooked nyob rau hauv siab -kawg iav ua teb.